Cedar Creek, TX, United States of America

Chris K Van Peski

This inventor holds 3 USPTO granted patents. Top assignee: Sematech, Inc.. Active years: 2009-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chris K Van Peski. Retrieved from https://idiyas.com/inventor/chris-k-van-peski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2009-2010

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3 patents (USPTO):Explore Patents

Title: Chris K Van Peski: Innovator in Semiconductor Lithography

Introduction

Chris K Van Peski is a notable inventor based in Cedar Creek, TX (US). He has made significant contributions to the field of semiconductor lithography, holding a total of 3 patents. His work focuses on the development of soft pellicles, which are essential in the lithography process used in semiconductor manufacturing.

Latest Patents

Van Peski's latest patents include a "Method for making soft pellicles," which relates to the fields of semiconductor lithography. This invention concerns methods, compositions, and apparatuses that utilize perfluorinated polymers in the creation of pellicles for 157 nm and 193 nm applications. Another significant patent is the "Soft pellicle and method of making same," which expands on the previous work by addressing various wavelengths, including 157 nm, 167 nm, 193 nm, 248 nm, 365 nm, and 436 nm.

Career Highlights

Chris K Van Peski is currently associated with Sematech, Inc., a leading organization in semiconductor research and development. His expertise in the field has positioned him as a valuable asset to the company, contributing to advancements in lithography technologies.

Collaborations

One of his notable coworkers is Paul A Zimmerman, with whom he has likely collaborated on various projects within the semiconductor industry.

Conclusion

Chris K Van Peski's innovative work in semiconductor lithography and his contributions through multiple patents highlight his importance in the field. His ongoing efforts continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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