This inventor holds 2 USPTO granted patents. Top assignee: Japan Synthetic Rubber Co., Ltd.. Active years: 1991-1993.
Location History:
- Yokkaichi, JP (1991)
- Chiba, JP (1993)
Company Filing History:
Years Active: 1991-1993
Title: Chozo Okuda: Innovator in Radiation-Sensitive Resin Technology
Introduction
Chozo Okuda is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 2 patents. His work focuses on developing materials that enhance the performance of photoresists used in integrated circuit production.
Latest Patents
Okuda's latest patents include a radiation-sensitive resin composition that contains an alkali-soluble resin. This composition features a polyhydroxy compound or a quinonediazidesulfonate of the polyhydroxy compound. It is designed to be a positive type photoresist, which exhibits excellent developability, effectively inhibiting scum generation during photoresist pattern formation. Additionally, it boasts high sensitivity, heat resistance, and a favorable thickness ratio upon development. Another notable patent is a positive type radiation-sensitive resin composition that includes an alkali-soluble novolac resin and a 1,2-quinonediazide compound. This resin is produced by condensing a carbonyl compound and a phenol mixture, resulting in a material that excels in resolution, sensitivity, developability, thermal resistance, and adhesion.
Career Highlights
Chozo Okuda is currently associated with Japan Synthetic Rubber Co., Ltd., where he continues to innovate in the field of resin technology. His work has been instrumental in advancing the capabilities of materials used in semiconductor manufacturing.
Collaborations
Okuda has collaborated with notable colleagues such as Takao Miura and Hiroshi Oka, contributing to the development of advanced materials in the industry.
Conclusion
Chozo Okuda's contributions to radiation-sensitive resin technology have positioned him as a key figure in the field. His innovative patents and collaborations continue to influence the development of materials essential for modern electronics.