Choung-Woo Park

Title: Choung-Woo Park: Innovator in Thin Film Transistor Technology

Introduction

Choung-Woo Park, a notable inventor based in Daejeon, South Korea, has made significant contributions to the field of semiconductor technology. He is recognized for his innovative work in developing materials and processes that enhance the performance of thin film transistor array panels.

Latest Patents

Choung-Woo Park holds a patent titled "Etchant for Electrode and Method of Fabricating Thin Film Transistor Array Panel Using the Same." This invention presents a novel etchant designed for etching metal wiring. The etchant comprises a mixture of several components: about 5 wt % to about 15 wt % hydrogen peroxide, an oxidant ranging from about 0.5 wt % to about 5 wt %, a fluoride-based compound (about 0.1 wt % to about 1 wt %), a nitrate-based compound (about 0.5 wt % to about 5 wt %), and a boron-based compound (about 0.05 wt % to about 1 wt %). This formulation aims to improve the efficiency and precision of the fabrication process for display technologies.

Career Highlights

Throughout his career, Choung-Woo Park has been associated with prominent companies such as Samsung Display Co., Ltd. and Soulbrain Co., Ltd. His experience in these leading firms has provided him with valuable insights and expertise in semiconductor manufacturing and innovative material development.

Collaborations

Choung-Woo Park has collaborated with talented coworkers such as Byeong-Jin Lee and Hong-Sick Park. Their teamwork has contributed to significant advancements in the semiconductor field, enhancing both product quality and production efficiency.

Conclusion

Choung-Woo Park's innovative contributions to semiconductor technology, particularly through his patent for a novel etchant, demonstrate his commitment to enhancing the functionality of thin film transistor systems. His work continues to influence the industry, paving the way for further advancements in display technologies and material science.