Chorng-Ping Chang

Title: Innovations of Chorng-Ping Chang

Introduction

Chorng-Ping Chang is a notable inventor based in Berkeley Heights, NJ (US). He holds a total of 3 patents that contribute significantly to the field of semiconductor device fabrication. His work focuses on improving device performance and reducing leakage current through innovative processes and materials.

Latest Patents

One of his latest patents is titled "Process for Device Fabrication." This invention outlines a process that utilizes shallow trench isolation. The process includes forming an oxidation barrier region, such as silicon nitride, above a silicon substrate. It also involves providing an opening in the oxidation barrier region, creating a trench in the silicon substrate, and depositing a dielectric material like silicon dioxide in the trench. The subsequent oxidation step rounds sharp corners of the silicon, which helps to reduce or eliminate leakage current.

Another significant patent is "Device Comprising Thermally Stable, Low Dielectric Constant Material." This invention addresses the issue of capacitive coupling in semiconductor devices, particularly MOSFETs. It provides a device structure that includes a silicon substrate, an isolation structure, an active device structure, and a dielectric layer. At least one dielectric component exhibits a dielectric constant of less than 3.5, which reduces capacitive coupling and enhances device properties.

Career Highlights

Chorng-Ping Chang has worked with prominent companies such as Agere Systems Inc. and AT&T Bell Laboratories. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Some of his notable coworkers include Chien-Shing Pai and Daniel L. Flamm. Their collaboration has likely contributed to the advancements in the projects they have worked on together.

Conclusion

Chorng-Ping Chang's contributions to semiconductor device fabrication through his patents demonstrate his innovative spirit and technical expertise. His work continues to influence the field and improve device performance.