This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Choong-seob Shin: Innovator in Semiconductor Manufacturing
Introduction
Choong-seob Shin is a notable inventor based in Uiwang, South Korea. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have the potential to enhance the efficiency and precision of semiconductor devices.
Latest Patents
Choong-seob Shin holds 1 patent for his invention titled "Methods of manufacturing semiconductor devices using alignment marks to align layers." This patent describes a method that includes forming a first alignment mark trench in a first material layer on a substrate. A first alignment mark via is then created by etching a second material layer beneath the first material layer. This alignment mark via is strategically positioned to communicate with the first alignment mark trench. The process culminates in the formation of a trench-via-merged-type first alignment mark by filling both the trench and the via with a light reflection material layer.
Career Highlights
Choong-seob Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor technology advancements. His expertise in manufacturing processes has contributed to the company's reputation for innovation.
Collaborations
Throughout his career, Choong-seob Shin has collaborated with talented individuals such as Jong-Su Kim and Bo-un Yoon. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
In summary, Choong-seob Shin is a prominent inventor whose work in semiconductor manufacturing is paving the way for future innovations. His contributions are vital to the ongoing evolution of technology in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
