Choon Hoong Hoo

Title: Innovations of Choon Hoong Hoo

Introduction

Choon Hoong Hoo is an accomplished inventor based in Round Rock, TX (US). He has made significant contributions to the field of semiconductor manufacturing, holding two patents that showcase his innovative approach to measuring overlay errors.

Latest Patents

His latest patents include a method and system for measuring overlay in a semiconductor manufacturing process. This involves capturing an image of a feature in an article at a predetermined manufacturing stage. The process derives a quantity of an image parameter from the image and converts this quantity into an overlay measurement. The conversion is referenced against an image parameter quantity derived from a reference image of a feature at the same manufacturing stage with known overlay ('OVL'). Additionally, the patent discloses a method for determining a device inspection recipe for use by an inspection tool. This includes identifying device patterns as candidate device care areas that may be sensitive to OVL, deriving an OVL response for each identified pattern, correlating the OVL response with measured OVL, and selecting some or all of the device patterns as device care areas based on the correlation.

Career Highlights

Choon Hoong Hoo is currently employed at Kla Tencor Corporation, where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in enhancing the accuracy and efficiency of manufacturing processes.

Collaborations

He collaborates with notable colleagues, including Fangren Ji and Amnon Manassen, who contribute to his projects and innovations.

Conclusion

Choon Hoong Hoo's contributions to semiconductor manufacturing through his patents reflect his dedication to innovation and excellence in the field. His work continues to influence the industry positively.