Taichung, Taiwan

Chong-Mu Chen


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2007-2011

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2 patents (USPTO):Explore Patents

Title: **Chong-Mu Chen: Innovator in Semiconductor Technology**

Introduction

Chong-Mu Chen is a notable inventor based in Taichung, Taiwan, recognized for his contributions to semiconductor technology. With two patents to his name, he has focused on innovations that enhance the manufacturing processes of semiconductor devices, particularly those involving silicon oxide and silicon nitride structures.

Latest Patents

His latest patent, titled "Method for forming oxide on ONO structure," outlines a sophisticated process for creating a semiconductor device featuring a silicon oxide/silicon nitride/silicon oxide (ONO) structure. The method involves providing a first silicon oxide layer and a silicon nitride layer over a substrate, which is segmented into memory and logic device regions. Key steps include patterning these layers to define partial ONO stacks, exposing the substrate, and conducting a rapid thermal annealing (RTA) in the presence of a radical oxidizing agent. This process not only forms a second silicon oxide layer and a gate oxide layer but also decreases processing time and thermal budget while increasing the coupling ratio of the polysilicon gate.

Career Highlights

Chong-Mu Chen is currently affiliated with Macronix International Co., Ltd., where he applies his expertise in semiconductor technologies. His work at Macronix focuses on the development and integration of innovative manufacturing methods that enhance the functionality and efficiency of memory devices.

Collaborations

Throughout his career, Chong-Mu has collaborated with talented colleagues, including Chih-Hao Wang and Hsin-Huei Chen. Their combined efforts reflect a commitment to advancing semiconductor technology through shared knowledge and innovative problem-solving.

Conclusion

Chong-Mu Chen's contributions to semiconductor technology, particularly through his patented methodologies, have significantly impacted the manufacturing landscape. His innovative approaches continue to pave the way for advancements in memory devices and logic circuits, affirming his position as a key figure in the field.

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