Carmel, IN, United States of America

Chong M Cha


 

Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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3 patents (USPTO):Explore Patents

Title: The Innovative Journey of Chong M Cha

Introduction

Chong M Cha, an inventive mind based in Carmel, Indiana, has made significant contributions to the field of chemical vapor deposition. With two patents to his name, his innovative approaches are shaping the future of material science and engineering. His work has garnered attention in industries that prioritize cutting-edge technology and efficiency.

Latest Patents

Chong's latest inventions focus on the development of a novel system for swirled flow chemical vapor deposition. The first patent describes a reactor vessel designed with an outer wall, a heat source, and both reactor inlet and outlet configurations. This unique design allows for the introduction of a precursor gas, generating a swirling flow around a porous preform situated in the vessel's central core region. The system effectively facilitates exhaust gas removal while maintaining a dynamic pressure greater than the pressure in the porous preform.

The second patent outlines a method that includes heating a reactor vessel, which contains a substrate in its central core region. By introducing a precursor gas through the configured reactor inlet, the swirling flow of the gas leads to material deposition on the substrate. This innovative method not only enhances the efficiency of the deposition process but also plays a crucial role in removing exhaust gas to maintain optimal conditions within the reactor vessel.

Career Highlights

Chong M Cha has developed a rich career working with reputable organizations, including Rolls-Royce Corporation and Rolls-Royce High Temperature Composites Inc. These experiences provided him with invaluable insights and opportunities to refine his innovative ideas in a collaborative industrial environment.

Collaborations

Throughout his career, Chong has worked alongside esteemed colleagues such as David Liliedahl and Richard W Kidd. Their collaborative efforts have undoubtedly contributed to the success of his research and innovations, fostering a productive environment where new ideas can flourish.

Conclusion

Chong M Cha stands out as an inventor driven by innovation and a commitment to advancing technology in chemical vapor deposition. His contributions, encapsulated in his patented technologies, highlight his role as a key player in the realm of material science. With his ongoing dedication to research and development, he continues to inspire future generations of engineers and inventors alike.

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