Milpitas, CA, United States of America

Chok Ho


Average Co-Inventor Count = 2.3

ph-index = 4

Forward Citations = 56(Granted Patents)


Company Filing History:


Years Active: 2002-2012

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6 patents (USPTO):Explore Patents

Title: Chok Ho: Innovator in Etching Processes for MEMS Production

Introduction

Chok Ho is a prominent inventor based in Milpitas, CA (US), known for his significant contributions to the field of microelectromechanical systems (MEMS). With a total of six patents to his name, he has developed innovative etching processes that enhance production efficiency and reduce costs.

Latest Patents

Chok Ho's latest patents focus on improving etching processes used in MEMS production. One of his notable inventions involves increasing the efficiency of an etching process by isolating and recirculating unused etchant. This method allows for the collection and removal of etching byproducts during the process. Additionally, components of the etchant can be isolated to generate more etchant, optimizing both the etchant and the layers being etched for specific processes. Another significant patent details a method for etching organic low-k dielectrics using ammonia (NH3) as an active etchant. This process achieves at least double the etch rate compared to traditional N2/H2 chemistries, thanks to the lower ionization potential of NH3, which results in higher plasma densities and etchant concentrations.

Career Highlights

Throughout his career, Chok Ho has worked with leading companies in the technology sector, including Lam Research Corporation and Qualcomm MEMS Technologies, Inc. His expertise in etching processes has made him a valuable asset in the development of advanced manufacturing techniques.

Collaborations

Chok Ho has collaborated with notable professionals in his field, including Kuo-Lung Tang and Chung-Ju Lee. These partnerships have contributed to the advancement of innovative solutions in MEMS production.

Conclusion

Chok Ho's work in etching processes has significantly impacted the MEMS industry, showcasing his dedication to innovation and efficiency. His patents reflect a deep understanding of the complexities involved in etching technologies, making him a key figure in this field.

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