The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Sep. 12, 2008
Philip Floyd, Redwood City, CA (US);
Chok Ho, Milpitas, CA (US);
Teruo Sasagawa, Los Gatos, CA (US);
Xiaoming Yan, Sunnyvale, CA (US);
Philip Floyd, Redwood City, CA (US);
Chok Ho, Milpitas, CA (US);
Teruo Sasagawa, Los Gatos, CA (US);
Xiaoming Yan, Sunnyvale, CA (US);
QUALCOMM MEMS Technologies, Inc., San Diego, CA (US);
Abstract
The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.