Cho-Han Li

Title: Innovations by Inventor Cho-Han Li in Chemical Vapor Deposition Technology

Introduction

Cho-Han Li, an inventive mind based in New Taipei, Taiwan, has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of three patents to his name, his work is pivotal in improving the efficiency and effectiveness of CVD processes, which are essential in semiconductor manufacturing.

Latest Patents

Among Cho-Han Li's latest innovations are two notable patents focusing on CVD apparatus and techniques. The first patent describes a CVD apparatus with multi-zone thickness control. This innovation involves a method where a process gas is introduced into a vacuum chamber and guided through a specially designed shower head. The unique feature of this design is that the process gas is distributed unevenly, resulting in a precursor material with an uneven thickness profile that can subsequently enhance semiconductor layer formation.

The second patent further elaborates on the concept of multi-zone thickness control within a CVD apparatus. In this design, the apparatus comprises a vacuum chamber and a strategically placed gas import. This setup improves planarity in the formed layers after the chemical mechanical polishing (CMP) process, by ensuring that the precursor material's uneven thickness matches the removal profile required for optimal outcomes.

Career Highlights

Cho-Han Li is associated with the Taiwan Semiconductor Manufacturing Company, known for being a leader in semiconductor fabrication. His contributions within this organization underscore the company's commitment to advancing technology in the semiconductor industry.

Collaborations

Throughout his career, Cho-Han Li has collaborated with talented peers, including Chung-Wei Fang and Yi Hsun Chiu. These collaborations reflect a strong team dynamic, fostering innovation and driving forward the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

In summary, Cho-Han Li is an accomplished inventor whose patents in chemical vapor deposition technology are vital to advancing semiconductor manufacturing processes. His innovative approaches to CVD apparatus design not only enhance production efficiency but also contribute significantly to the overall quality and performance of semiconductor devices.