Taoyuan, Taiwan

Chiu-hsiung Tsai

This inventor holds 1 USPTO granted patent. Top assignee: G-Fun Industrial Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chiu-hsiung Tsai. Retrieved from https://idiyas.com/inventor/chiu-hsiung-tsai-b0joarbm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Chiu-hsiung Tsai: Innovator in Composite Structures

Introduction

Chiu-hsiung Tsai is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of composite materials, particularly through his innovative patent.

Latest Patents

Chiu-hsiung Tsai holds a patent for a composite structure, resin film, and method of manufacturing resin film. This invention provides a composite structure that includes a release carrier and a resin film. The release carrier consists of a release substrate and a release resin layer that is formed on the release substrate. The release resin layer covers the release substrate at a coverage rate of between 60% and 100%. The resin film is formed on the release carrier and is bonded to both the release substrate and the release resin layer. This patent showcases his expertise in material science and engineering.

Career Highlights

Chiu-hsiung Tsai is associated with G-Fun Industrial Corporation, where he applies his knowledge and skills in developing advanced composite materials. His work has contributed to the company's reputation in the industry.

Collaborations

Chiu-hsiung Tsai has collaborated with notable colleagues such as Kuo-chin Chen and Chun-jen Niu. These collaborations have likely enhanced the innovation process and led to further advancements in their respective fields.

Conclusion

Chiu-hsiung Tsai is a distinguished inventor whose work in composite structures has made a significant impact. His patent reflects his innovative spirit and dedication to advancing material technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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