Ching-Wen Wang

Title: Innovations of Ching-Wen Wang

Introduction

Ching-Wen Wang is a notable inventor based in Changhua County, Taiwan. He has made significant contributions to the field of photodiodes, holding two patents that showcase his innovative approach to technology. His work focuses on enhancing the performance of silicon photodiodes through advanced designs and structures.

Latest Patents

Ching-Wen Wang's latest patents include a silicon photodiode with a symmetry layout and deep well bias in CMOS technology. This invention features a substrate, a deep well, and a PN diode structure. The deep well is strategically placed on the substrate, allowing for an extra bias that eliminates interference from the substrate absorbing light. This design greatly improves the speed and bandwidth of the photodiode. Additionally, the symmetry layout of the silicon photodiode ensures a uniform electric field distribution, further reducing substrate noise interference.

Another significant patent is the lateral avalanche photodiode structure. This structure consists of a substrate, a PN diode, and a metal layer. The substrate is designed with various electrode areas arranged horizontally, with the first electrode area serving as an avalanche area. The light receiving area is positioned between the first and second electrode areas, optimizing the photodiode's functionality.

Career Highlights

Ching-Wen Wang is affiliated with National Central University, where he continues to advance his research and development in photodiode technology. His work has garnered attention for its innovative solutions to common challenges in the field.

Collaborations

Ching-Wen Wang collaborates with esteemed colleagues, including Yue-Ming Hsin and Fang-Ping Chou, who contribute to his research endeavors.

Conclusion

Ching-Wen Wang's contributions to the field of photodiodes exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving performance and efficiency in electronic devices.