Ching-Thiam Chung

Title: Innovations by Ching-Thiam Chung in Semiconductor Manufacturing

Introduction

Ching-Thiam Chung is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. He has developed innovative methods that enhance the fabrication processes of CMOS devices. His work has significant implications for the efficiency and effectiveness of semiconductor technology.

Latest Patents

Chung holds a patent for a method of self-aligning a damascene gate structure to isolation regions. This process allows for the fabrication of a CMOS device where conductive gate structures are defined in a self-aligned manner to shallow trench isolation (STI) regions, eliminating the need for photolithographic procedures. The method involves defining shallow trench openings in semiconductor substrates, filling them with silicon oxide, and removing dummy gate structures. This results in STI regions that consist of filled shallow trench openings and silicon oxide shapes, ultimately leading to the formation of a conductive gate structure that is self-aligned to the STI regions. He has 1 patent to his name.

Career Highlights

Ching-Thiam Chung is currently employed at Chartered Semiconductor Manufacturing Ltd, where he continues to innovate in the semiconductor industry. His work has contributed to advancements in CMOS technology, making significant strides in manufacturing processes.

Collaborations

Chung has collaborated with notable colleagues such as Daniel Yen and Wei Hua Cheng, contributing to a dynamic work environment that fosters innovation and development in semiconductor technologies.

Conclusion

Ching-Thiam Chung's innovative methods in semiconductor manufacturing exemplify the importance of research and development in advancing technology. His contributions continue to influence the field and pave the way for future innovations.