Company Filing History:
2 out of 442 
1 out of 183 Years Active: 2000-2014
Title: Ching-Shun Lin: Innovator in Semiconductor Technology
Introduction
Ching-Shun Lin is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the functionality and efficiency of electronic devices.
Latest Patents
Ching-Shun Lin's latest patents include innovative methods and circuits that improve the performance of USB devices and semiconductor fabrication. One of his patents is a "Method and circuit for trimming an internal oscillator of a USB device." This invention involves a circuit that generates a clock signal as a frequency source for the USB device. It includes a counter, detectors for packet detection, and a trimming code controller that adjusts the clock frequency of the internal oscillator based on a reference value.
Another significant patent is the "Method for fabricating a concave bottom oxide in a trench." This method outlines a process for forming a concave bottom oxide layer in a trench on a semiconductor substrate. It involves several steps, including the formation of a pad oxide layer, etching processes, and the deposition of a silicon oxide layer to create the desired trench structure.
Career Highlights
Throughout his career, Ching-Shun Lin has worked with prominent companies in the semiconductor industry. He has been associated with Mosel Vitelic Corporation and Elan Microelectronics Corporation, where he contributed to various innovative projects and advancements in technology.
Collaborations
Ching-Shun Lin has collaborated with talented individuals in his field, including Chih-Ta Wu and Chien-Hung Chen. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Ching-Shun Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to impact the industry and pave the way for future advancements.