Chandler, AZ, United States of America

Ching-Ping Fang


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Ching-Ping Fang: Innovator in Chemical Vapor Deposition Technology

Introduction

Ching-Ping Fang is a notable inventor based in Chandler, AZ (US). She has made significant contributions to the field of chemical vapor deposition (CVD) technology. Her innovative work focuses on enhancing the efficiency and effectiveness of precursor deposition processes.

Latest Patents

Ching-Ping Fang holds a patent for a groundbreaking invention titled "Precursor deposition using ultrasonic nebulizer." This patent describes a CVD apparatus designed for depositing a low vapor pressure copper precursor onto a silicon wafer. The apparatus features a CVD reaction chamber that includes a substrate holder, which supports the silicon wafer at a predetermined position. An ultrasonic nebulizer is connected to the CVD reaction chamber, allowing it to connect to a source of liquid precursor. The nebulizer atomizes the liquid precursor and deposits it onto the substrate. Additionally, a gas distribution ring within the chamber directs a gas toward the atomized precursor, enhancing the deposition process.

Career Highlights

Ching-Ping Fang has established herself as a key figure in her field through her innovative work. She is currently employed at Tokyo Electron Limited, where she continues to develop advanced technologies in semiconductor manufacturing. Her expertise in CVD processes has positioned her as a valuable asset to her company and the industry.

Collaborations

Ching-Ping Fang collaborates with various professionals in her field, including her coworker Joseph T Hillman. Their combined efforts contribute to the advancement of technologies related to chemical vapor deposition.

Conclusion

Ching-Ping Fang's contributions to the field of chemical vapor deposition technology are noteworthy. Her innovative patent and ongoing work at Tokyo Electron Limited highlight her role as a leading inventor in this specialized area. Her dedication to advancing semiconductor manufacturing processes continues to impact the industry positively.

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