This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Ching-Lang Yen: Innovator in Semiconductor Technology
Introduction
Ching-Lang Yen is a notable inventor based in Taichung Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of isolation structures. His innovative methods have paved the way for advancements in the manufacturing processes of semiconductor devices.
Latest Patents
Ching-Lang Yen holds a patent for a "Method of forming shallow trench isolation structure." This patent describes a detailed process involving the formation of a mask layer and a photoresist layer with an opening on a substrate. The photoresist layer acts as an etching mask, allowing for the etching of both the mask layer and the substrate to create a trench. The method includes steps for widening the opening, removing portions of the mask layer, rounding the trench corners, and filling the trench with insulation material to establish a shallow trench isolation structure.
Career Highlights
Ching-Lang Yen is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to contribute to cutting-edge technologies and innovations in semiconductor manufacturing.
Collaborations
Ching-Lang Yen has collaborated with his coworker, Chingfu Lin, to further enhance the development of semiconductor technologies. Their partnership exemplifies the collaborative spirit that drives innovation in the tech industry.
Conclusion
Ching-Lang Yen's contributions to semiconductor technology, particularly through his patented methods, highlight his role as an influential inventor in the field. His work continues to impact the industry positively, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile