This inventor holds 2 USPTO granted patents. Top assignee: Merck Patent Gmbh. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Ching-Jung Kan: Innovator in High-Purity Acid Production
Introduction
Ching-Jung Kan is a notable inventor based in Nantou, Taiwan. He has made significant contributions to the semiconductor industry through his innovative methods for producing high-purity acids. With a total of 2 patents, his work is essential for advancing manufacturing processes in this critical field.
Latest Patents
Ching-Jung Kan's latest patents include a method for producing high-purity hydrochloric acid. This invention relates to a novel method that can be carried out according to industrial standards, aimed at producing high-purity hydrochloric acid with a very low particle content, specifically for use in semiconductor production. Another significant patent is his method for producing high-purity sulfuric acid. This invention involves adding a hydrogen peroxide solution to engineered oleum to reduce SO concentration, followed by the evaporation of SO and separation of acid traces. The high-purity SO is then enriched with inert gas and absorbed into sulfuric acid, making it suitable for the semiconductor industry.
Career Highlights
Ching-Jung Kan is currently associated with Merck Patent GmbH, where he continues to develop innovative solutions for the semiconductor sector. His expertise in high-purity acid production has positioned him as a key player in this specialized field.
Collaborations
Ching-Jung Kan has collaborated with notable colleagues, including Chih-Peng Lu and Werner Büttner. These collaborations have further enhanced the development of his innovative methods and contributed to advancements in the industry.
Conclusion
Ching-Jung Kan's contributions to high-purity acid production are vital for the semiconductor industry. His innovative methods and patents reflect his commitment to advancing technology in this essential field.