The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2004

Filed:

Apr. 08, 2002
Applicant:
Inventors:

Werner Büttner, Darmstadt, DE;

Martin Hostalek, Darmstadt, DE;

Ching-Jung Kan, Nan-Tou, TW;

Chih-Peng Lu, Lin-kou Village, TW;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 7/07 ;
U.S. Cl.
CPC ...
C01B 7/07 ;
Abstract

This invention relates to a novel method, which can be carried out according to industrial standards, for producing high-purity hydrochloric acid with a very low particle content, for use in the production of semiconductors.


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