This inventor holds 1 USPTO granted patent. Top assignee: Macronix International Co., Ltd.. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Ching-Hui Wang: Innovator in Photoresist Technology
Introduction
Ching-Hui Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photoresist technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency and reliability of dispensing systems in semiconductor manufacturing.
Latest Patents
Ching-Hui Wang holds a patent for a "Photoresist pump dispense detection system." This invention features a detection circuit that includes a first relay coupled to a solenoid valve for sensing the operation state of the solenoid valve. Additionally, it incorporates a second relay that activates in response to the first relay, a sensor for detecting the operation state of a device, and a third relay that is activated by the sensor's signal. The system is designed to ensure that the second relay is deactivated when the third relay is activated, with a fourth relay that is activated when the first relay is deactivated and the second relay is activated. This complex arrangement enhances the reliability of photoresist dispensing processes.
Career Highlights
Ching-Hui Wang is currently employed at Macronix International Co., Ltd., a leading company in the semiconductor industry. His work at Macronix has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor manufacturing technologies.
Collaborations
Ching-Hui Wang has collaborated with notable colleagues, including Tsung-Han Peng and Hsien-Chung Chen. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Ching-Hui Wang's contributions to the field of photoresist technology through his patent demonstrate his commitment to innovation in semiconductor manufacturing. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
