Ching-Hsu Chang

Title: Innovations of Ching-Hsu Chang

Introduction

Ching-Hsu Chang is a notable inventor based in Yuan-Lin, Taiwan. He has made significant contributions to the field of photolithography and semiconductor manufacturing. With a total of 3 patents to his name, Chang's work has advanced the technology used in the production of integrated circuits.

Latest Patents

One of his latest patents is a photolithography process with multiple exposures. This innovative process involves placing and aligning a photomask above a wafer with a photoresist at a predetermined distance. Multiple exposures are performed sequentially on the photoresist through the photomask, each with an optimized illuminating setting for the photomask's duty ratio. This method achieves optimum through-pitch performance for pattern transfer from the photomask to the photoresist, followed by a development process on the photoresist.

Another significant patent is a method of forming a dual damascene structure. This method begins with a substrate that has a conductive layer. A series of layers, including a passivation layer, a first dielectric layer, an etching stop layer, a second dielectric layer, and a cap layer, are formed sequentially over the substrate. The cap layer and the second dielectric layer are patterned to create openings that expose portions of the etching stop layer. The process continues with the removal of specific layers to form a trench and a via opening, ultimately leading to the formation of a conformal barrier layer and a conductive layer that fills these openings.

Career Highlights

Ching-Hsu Chang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas in practical applications, contributing to advancements in semiconductor technology.

Collaborations

Chang has collaborated with several talented individuals in his field, including I-Hsiung Huang and Jiunn-Ren Hwang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Ching-Hsu Chang's contributions to the field of photolithography and semiconductor manufacturing are noteworthy. His innovative patents and collaborative efforts continue to influence the industry positively.