Hsinchu, Taiwan

Ching-Hsiu Wu

This inventor holds 1 USPTO granted patent. Top assignee: Powerchip Semiconductor Manufacturing Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ching-Hsiu Wu. Retrieved from https://idiyas.com/inventor/ching-hsiu-wu-7ueedfsv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Ching-Hsiu Wu: Innovator in Semiconductor Manufacturing

Introduction

Ching-Hsiu Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.

Latest Patents

Ching-Hsiu Wu holds a patent for a manufacturing method of an interconnect structure. This method involves providing a substrate, forming sacrificial layers on the substrate, and creating a dielectric layer between two adjacent sacrificial layers. An air gap is incorporated in the dielectric layer, and the sacrificial layers are subsequently removed to form first openings. A conductive layer is then formed in the first opening, showcasing a novel approach to interconnect structures.

Career Highlights

Wu is currently employed at Powerchip Semiconductor Manufacturing Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing manufacturing processes within the industry.

Collaborations

Ching-Hsiu Wu has collaborated with notable colleagues, including Hung-Yao Huang and Shyng-Yeuan Che. Their combined efforts contribute to the innovative environment at Powerchip Semiconductor Manufacturing Corporation.

Conclusion

Ching-Hsiu Wu's contributions to semiconductor manufacturing through his patent demonstrate his innovative spirit and commitment to advancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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