Hsinchu, Taiwan

Ching-Feng Tsai


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2000-2003

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2 patents (USPTO):Explore Patents

Title: Innovations of Ching-Feng Tsai

Introduction

Ching-Feng Tsai is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing through his innovative patents. With a total of 2 patents, Tsai's work focuses on improving slurry distribution and stabilization in CMP machines.

Latest Patents

One of his latest patents is a slurry distributor, which features a base section, a main body section, a distributing structure, and a connecting structure. The main body section is positioned above the base section, while the distributing structure is located above the main body section. This innovative design allows for the accommodation of one or more types of slurry, enabling the mixing of different slurry types and channeling out a well-mixed slurry. Additionally, the distributing structure includes multiple holes close to the main body section. The connecting structure is integrated within the base section to engage with a chemical-mechanical polishing installation.

Another significant patent by Tsai involves a method for stabilizing slurry used in chemical mechanical polishing. This method aims to reduce agglomerated particles in the slurry utilized by CMP machines, which also use deionized water. The process includes monitoring the pH of both the slurry and the deionized water, followed by adjusting the pH of the deionized water to match that of the slurry.

Career Highlights

Ching-Feng Tsai has worked with prominent companies in the technology sector, including Promos Technologies, Inc. and Mosel Vitelic Corporation. His experience in these organizations has contributed to his expertise in the field of chemical mechanical polishing.

Collaborations

Some of his notable coworkers include Champion Yi and Jiun-Fang Wang, who have collaborated with him on various projects.

Conclusion

Ching-Feng Tsai's innovative patents and contributions to the field of chemical mechanical polishing highlight his role as a significant inventor. His work continues to influence advancements in slurry technology and CMP processes.

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