Ching En Chen

Title: Innovations of Ching En Chen

Introduction

Ching En Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to semiconductor structures.

Latest Patents

Ching En Chen's latest patents include advanced semiconductor structures. The first patent describes a semiconductor structure that consists of a substrate with a first region and a second region. It features a first device in the first region and a second device in the second region. Additionally, it includes a first isolation between a first source and a first drain, with a first spacer overlapping the first isolation, separated by a first gate dielectric. The second patent also outlines a semiconductor structure with a semiconductor substrate that has a first region and a second region. In this design, the voltage level of the first device is greater than that of the second device. It incorporates a first isolation with a specific depth in the first region and a second isolation in the second region, where the first depth is greater than the second depth.

Career Highlights

Ching En Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on developing innovative semiconductor solutions that enhance device performance and efficiency.

Collaborations

Ching En Chen collaborates with talented professionals in his field, including Jing-Jung Huang and Jung-Hui Kao. Their teamwork contributes to the advancement of semiconductor technologies and fosters a collaborative environment for innovation.

Conclusion

Ching En Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field positively, paving the way for future innovations.