Ching-Chung Lin

Title: Innovations of Ching-Chung Lin

Introduction

Ching-Chung Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist removal processes. With a total of 2 patents, Lin's work has had a considerable impact on the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

One of Lin's latest patents is a method and apparatus with heat treatment for stripping photoresist to eliminate post-strip photoresist extrusion defects. This innovative method involves removing a photoresist layer from a semiconductor substrate following a conventional dry etching step. The process begins with a first wet chemical treatment that strips the photoresist. A second dry ash with oxygen plasma completes the photoresist removal. To ensure complete removal of photoresist embedded on or within the material underlying the photoresist film, the semiconductor substrate is preheat treated to a temperature in the range of 150 to 250 degrees Centigrade. This preheating step releases the photoresist prior to the second dry ash with oxygen plasma operation. Notably, this method effectively eliminates photoresist extrusion defects that can occur during a bond pad alloy operation.

Career Highlights

Ching-Chung Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and improve semiconductor manufacturing processes. His expertise in photoresist technology has positioned him as a valuable asset in the industry.

Collaborations

Lin collaborates with various professionals in his field, including his coworker, Chiang-Jen Peng, who brings her own expertise to their projects.

Conclusion

Ching-Chung Lin's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing the industry. His work not only enhances manufacturing processes but also sets a standard for future innovations in the field.