This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Nano-Architect Research Corporation. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Innovations of Ching-An Chen in Plasma Technology
Introduction
Ching-An Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of plasma technology, particularly in the treatment of wafers. His innovative approach has led to advancements that enhance the efficiency and effectiveness of plasma applications.
Latest Patents
Ching-An Chen holds a patent for a "Method and apparatus for generating high-density uniform plasma." This invention discloses a method and a reactor designed for plasma treating a wafer with high induction plasma density and high uniformity of reactive species. The inductively coupled plasma reactor includes a vacuum chamber with a dielectric ceiling and a unique coil configuration atop the dielectric ceiling. The design of the dielectric ceiling varies in height according to its shape, which can be planar, dish-shaped, or hat-shaped. This configuration allows for the coupling of RF power into the chamber to excite the plasma. The unique coil arrangement consists of multiple helical coils that can be arranged in series or parallel, providing a high-density uniform ion plasma suitable for large wafer treatment. Ching-An Chen's patent is a testament to his innovative spirit and technical expertise.
Career Highlights
Ching-An Chen is associated with Nano-Architect Research Corporation, where he continues to push the boundaries of plasma technology. His work has been instrumental in developing methods that improve the quality and efficiency of semiconductor manufacturing processes.
Collaborations
Ching-An Chen has collaborated with notable colleagues, including David Guang-Kai Jeng and Jui-Hung Yeh. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Ching-An Chen's contributions to plasma technology exemplify the impact of innovative thinking in the semiconductor industry. His patent for generating high-density uniform plasma showcases his commitment to advancing technology and improving manufacturing processes. His work continues to inspire future innovations in the field.