This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignees: Industry-University Cooperation Foundation Hanyang University, Samsung Electronics Co., Ltd., Sungkyunkwan University. Active years: 2013-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
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Years Active: 2013-2026
Title: Innovations by Chin Wook Chung in Substrate Processing Technology
Introduction
Chin Wook Chung is an esteemed inventor based in Seoul, South Korea. His innovations have made significant contributions to substrate processing technology, a crucial area in various industries, including electronics. With a notable patent to his name, Chung's work reflects his deep understanding and expertise in the realm of technological advancements.
Latest Patents
Chin Wook Chung holds a patent for a Substrate Processing Apparatus. This innovative apparatus features a vacuum chamber with a reaction space designed to generate plasma, where the target substrate is placed. Among its key components are a low frequency antenna unit and a high frequency antenna unit, both located outside the reaction space. These units work in tandem with their respective power supplies to enhance plasma generation efficiency. The unique design of the apparatus allows for efficient ignition of plasma using the high frequency antenna, while improving inductive coupling between the plasma and the low frequency antenna. This advancement holds great potential for increasing the overall efficiency of substrate processing.
Career Highlights
Chin Wook Chung is associated with Samsung Electronics Co., Ltd., a leading global company in the technology sector. During his time at Samsung, he has dedicated himself to research and development in substrate processing technologies, making strides that further the company's innovation goals.
Collaborations
Throughout his career, Chung has collaborated with notable colleagues, including Sang Jean Jeon and Guen Suk Lee. These collaborations have facilitated the exchange of ideas and expertise, contributing to the development of cutting-edge technologies in the substrate processing field.
Conclusion
Chin Wook Chung's contributions to substrate processing technology underscore the importance of innovation in today's fast-paced technological landscape. His patent illustrates a commitment to improving efficiency and efficacy in substrate processing, ensuring that industry standards continue to advance. As he furthers his research at Samsung Electronics, the potential for future innovations remains vast.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile