Chin-Piao Chang

Title: Innovations of Chin-Piao Chang

Introduction

Chin-Piao Chang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on methods for testing and evaluating wafers in semiconductor manufacturing.

Latest Patents

Chin-Piao Chang holds a patent for a "System and method for film stress and curvature gradient mapping for screening problematic wafers." This innovative method involves testing a wafer after a current top layer is formed over it. The process collects stress data derived from changes in wafer curvature. The stress data includes stress-xx in the x direction and stress-yy in the y direction for each area of a set of finite areas on the wafer. The stress-xx and stress-yy are derived from wafer-curvature-change-xx and wafer-curvature-change-yy, respectively. Additionally, the stress-xy is derived from wafer-curvature-change-xy, which indicates a change in wafer twist in the x-y plane. A stress gradient vector is calculated and used to evaluate the accumulated layers.

Career Highlights

Chin-Piao Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in wafer testing and evaluation has positioned him as a valuable asset to the company.

Collaborations

Chin-Piao Chang has collaborated with notable colleagues, including Hsueh-Hung Fu and Chih-Wei Chang. Their combined efforts contribute to advancements in semiconductor technology.

Conclusion

Chin-Piao Chang's innovative work in wafer testing and evaluation showcases his significant contributions to the semiconductor industry. His patent reflects a deep understanding of the complexities involved in semiconductor manufacturing.