Chin-Piao Chang

Title: Chin-Piao Chang: Innovator in Semiconductor Technology

Introduction

Chin-Piao Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative memory devices and semiconductor structures, showcasing his expertise and creativity in the industry.

Latest Patents

Chin-Piao Chang's latest patents include a memory device and a method of forming the same. This memory device comprises a semiconductor substrate, an isolation structure, and an anti-fuse structure. The isolation structure is strategically placed within the semiconductor substrate, while the anti-fuse structure contains a first electrode and a second electrode, both positioned below the top surface of the semiconductor substrate. Another notable patent is for a semiconductor structure and the method of forming it. This method involves creating a dielectric stack on a bottom metal, followed by the formation of a first mask layer with multiple through holes. A second mask layer is then patterned to create openings, allowing for the etching of the dielectric stack and the formation of a conductive layer.

Career Highlights

Chin-Piao Chang is currently employed at Nan Ya Technology Corporation, where he continues to push the boundaries of semiconductor innovation. His work has not only advanced the technology but has also contributed to the company's reputation as a leader in the field.

Collaborations

Chin-Piao Chang collaborates with talented individuals such as Chien-An Yu and Yuan-Sung Chang. These partnerships enhance the creative process and lead to groundbreaking advancements in semiconductor technology.

Conclusion

Chin-Piao Chang is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the field. His contributions continue to shape the future of memory devices and semiconductor structures.