Company Filing History:
Years Active: 2008
Title: Innovations of Chin Hsian Lin
Introduction
Chin Hsian Lin is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.
Latest Patents
Chin Hsian Lin holds a patent for a "System and method for processing masks with oblique features." This invention discloses a method and system for processing one or more oblique features on a mask or reticle substrate. The process involves aligning the mask or reticle substrate with a predetermined reference system, determining an offset angle of a feature to be processed, and rotating the substrate accordingly. The feature is then processed using the predetermined reference system, ensuring precision in either the horizontal or vertical reference direction.
Career Highlights
Chin Hsian Lin is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has contributed to advancements in mask processing techniques, enhancing the efficiency and accuracy of semiconductor manufacturing.
Collaborations
Chin Hsian Lin has collaborated with notable colleagues, including Burn Jeng Lin and Ping Yang, who have also contributed to the field of semiconductor technology.
Conclusion
Chin Hsian Lin's innovative work in processing masks with oblique features showcases his expertise and commitment to advancing semiconductor technology. His contributions continue to impact the industry positively.