The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Jan. 27, 2004
Burn Jeng Lin, Hsin chu, TW;
Ping Yang, Kao-Hsing, TW;
Hong Chang Hsieh, Hsin-chu, TW;
Yao Ching Ku, Hsin-chu, TW;
Chin Hsian Lin, Hsin-chu, TW;
Chiu Shan Yoo, Hsin-chu, TW;
Burn Jeng Lin, Hsin chu, TW;
Ping Yang, Kao-Hsing, TW;
Hong Chang Hsieh, Hsin-chu, TW;
Yao Ching Ku, Hsin-chu, TW;
Chin Hsian Lin, Hsin-chu, TW;
Chiu Shan Yoo, Hsin-chu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method and system is disclosed for processing one or more oblique features on a mask or reticle substrate. After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed on the mask or reticle substrate with regard to either the horizontal or vertical reference direction of the predetermined reference system is determined. The mask or reticle substrate is rotated in a predetermined direction by the offset angle; and the feature on the mask or reticle substrate is processed using the predetermined reference system wherein the feature is processed in either the horizontal or vertical reference direction thereof.