Chin-Hao Chen

Title: Innovations of Chin-Hao Chen

Introduction

Chin-Hao Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of filter structures, holding a total of five patents. His work focuses on improving the efficiency and functionality of electronic components.

Latest Patents

One of his latest patents is a filter structure improvement. This innovation includes a substrate, resonance layers, a grounded layer, a pattern layer, an input electrode, and an output electrode. The substrate features resonance holes where the resonance layers are positioned. One end of the resonance hole is on the open surface, while the other end is on the short-circuit surface. The grounded layer is situated on the short-circuit surface, top surface, bottom surface, and side surfaces, and it is electrically connected to the resonance layers to form a short-circuit end. The input and output electrodes are electrically isolated from the grounded layer and are located on the bottom or open surface of the substrate. The arrangement of the pattern layer, resonance layers, and grounded layer allows for the desired frequency band to be achieved by adjusting the pattern layer and the lengths of the resonance layers.

Career Highlights

Chin-Hao Chen is currently employed at Cirocomm Technology Corporation, where he continues to innovate in the field of electronic components. His expertise in filter structures has positioned him as a key player in the industry.

Collaborations

He collaborates with talented coworkers, including Shin-Hui Chou and Yue-Cheng Jhong, who contribute to the development of advanced technologies in their projects.

Conclusion

Chin-Hao Chen's contributions to filter structure innovations demonstrate his commitment to advancing technology in the electronics field. His patents reflect a deep understanding of the complexities involved in creating efficient electronic components.