Company Filing History:
Years Active: 2022-2025
Title: Chiju Hsieh: Innovator in Plasma Processing Technology
Introduction
Chiju Hsieh is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on methods that enhance the efficiency and effectiveness of etching processes in semiconductor manufacturing.
Latest Patents
Chiju Hsieh's latest patents include a method of etching a film and a plasma processing apparatus. This innovative method involves etching a film on a substrate that includes an underlying region, the film itself, and a mask. The process consists of performing main etching through plasma etching, which exposes part of the underlying region. After the main etching, a protective layer is formed on the side wall surface of the mask, using a material different from that of the film. The method also includes over-etching on the film, further utilizing plasma etching techniques.
Career Highlights
Chiju Hsieh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His expertise in plasma processing has positioned him as a key player in advancing technologies that are critical for modern electronics.
Collaborations
Chiju has collaborated with notable coworkers such as Kosuke Ogasawara and Kentaro Ishii. Their combined efforts contribute to the innovative environment at Tokyo Electron Limited.
Conclusion
Chiju Hsieh's contributions to plasma processing technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape the future of manufacturing processes.