Chihhui Wu

Title: Chihhui Wu: Innovator in Optical Proximity Correction

Introduction

Chihhui Wu is a notable inventor based in Hillsboro, Oregon. He has made significant contributions to the field of optical proximity correction (OPC) in integrated circuit design. His innovative work has led to the development of a unique method that enhances the accuracy of lithography processes.

Latest Patents

Chihhui Wu holds a patent for a "Multilayer optical proximity correction (OPC) model for OPC correction." This method involves creating a semi-physical model of a mask for a current layer in an integrated circuit design layout. The model utilizes physical parameters of the lithography process to specify contours of various features of the mask. The process determines if the current layer is deformed by overlapping reference layers. If deformation is detected, the semi-physical model and design information are input into a trained machine learning algorithm. This generates a contour shift prediction for the current layer, which is then used for multilayer OPC correction.

Career Highlights

Chihhui Wu is currently employed at Intel Corporation, where he continues to push the boundaries of innovation in semiconductor technology. His work is crucial in improving the efficiency and accuracy of integrated circuit manufacturing.

Collaborations

Chihhui has collaborated with talented colleagues such as Hyungjin Ma and Gregory Toepperwein. Their combined expertise contributes to the advancement of technologies in the semiconductor industry.

Conclusion

Chihhui Wu's contributions to optical proximity correction demonstrate his commitment to innovation in the field of integrated circuits. His patent reflects a significant advancement in lithography processes, showcasing the importance of collaboration and technological development in the industry.