Chih Wei Wen

Title: Innovations in Photomask Repair: The Contributions of Chih Wei Wen

Introduction

Chih Wei Wen is a notable inventor based in Tainan, Taiwan. With a focus on the semiconductor industry, he has made significant advancements in the methods used for repairing photomasks, which are crucial for integrated circuit fabrication. As a result of his innovative contributions, he holds two patents that highlight his expertise and creativity in the field.

Latest Patents

Chih Wei Wen's latest patents include innovative methods designed to repair defects in photomasks effectively. The first patent, titled "Method for repairing photomask," presents a unique approach to addressing defects such as pinholes. This method utilizes a laser beam to create a matrix of laser burn spots in the substrate near the defect. By melting the material around the defect, this technique effectively blocks light from passing through the flaw, maintaining the photomask's functionality without the need to remove its pellicle and frame.

The second patent, "Method for repair of photomasks," focuses on optimizing the defect repair process within fabrication systems. This method introduces an effective amount of styrene to reduce the amount of etching assist gas remaining on the MOS film, which diminishes surface defects on the photomask. Both patents not only showcase Wen's ingenuity but also contribute significantly to improving the quality of semiconductor manufacturing.

Career Highlights

Chih Wei Wen's career is marked by his role at Taiwan Semiconductor Manufacturing Company Limited (TSMC), one of the leading firms in the semiconductor industry. His work in photomask repair has been pivotal in advancing the quality and reliability of integrated circuit production. With his two patents, he has established himself as a key figure in innovation within his company and the industry as a whole.

Collaborations

Throughout his career, Chih Wei Wen has collaborated with notable colleagues, including Wu Hung Ko and Kun-Lung Hsieh. These partnerships have enabled the exchange of knowledge and expertise, further enhancing the development of innovative solutions in photomask technology and integrated circuit fabrication.

Conclusion

Chih Wei Wen's contributions to the field of photomask repair exemplify the impact of innovation in the semiconductor industry. His patented methods not only resolve critical defects but also improve manufacturing efficiency, demonstrating a commitment to quality and excellence. As the industry continues to evolve, inventors like Wen play a vital role in shaping the future of technology.