Chih Wei Hsu

Title: The Innovations of Chih Wei Hsu

Chih Wei Hsu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the efficiency and reliability of semiconductor devices.

Latest Patents

Chih Wei Hsu holds a patent for a trench-based device with improved trench protection. This semiconductor device includes a semiconductor substrate with a first type of conductivity. A first layer is formed on the substrate, which is more lightly doped than the substrate itself. At least one trench is formed in the first layer, and a dielectric layer lines the bottom surface and sidewalls of the trench. A conducting material fills the trench, and a lightly doped region is formed in the first layer with a second conductivity type, positioned below the trench's bottom surface. A metal layer is placed over the first layer and the conducting material, with a first electrode formed over the metal layer and a second electrode on the backside of the substrate. This innovative design enhances the performance and durability of semiconductor devices.

Career Highlights

Chih Wei Hsu is currently employed at Vishay General Semiconductor, Inc., where he continues to develop cutting-edge semiconductor technologies. His expertise in the field has led to advancements that benefit various applications in electronics.

Collaborations

Chih Wei Hsu collaborates with talented professionals, including his coworker Max Sk Chen. Together, they work on innovative projects that push the boundaries of semiconductor technology.

Conclusion

Chih Wei Hsu's contributions to semiconductor technology through his patent and work at Vishay General Semiconductor, Inc. highlight his role as an influential inventor in the industry. His innovative designs continue to shape the future of electronics.