Company Filing History:
Years Active: 2020-2023
Title: Chih-Wei Hsieh: Innovator in Semiconductor Technology
Introduction
Chih-Wei Hsieh is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and performance of semiconductor devices.
Latest Patents
One of Chih-Wei Hsieh's latest patents involves a contact structure for a semiconductor device. This innovation includes a fin structure disposed on a substrate, with a gate feature that traverses the fin structure to overlay a central portion. Additionally, it features a pair of source/drain structures along the fin, positioned at respective sides of the gate feature. The patent also describes a plurality of contact structures made of tungsten, ensuring that both the gate electrode and the source/drain features are directly coupled to these contact structures.
Career Highlights
Chih-Wei Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the technology used in modern electronic devices.
Collaborations
Chih-Wei has collaborated with notable colleagues, including Hong-Ying Lin and Cheng-Yi Wu. Their combined expertise has contributed to the successful development of innovative semiconductor solutions.
Conclusion
Chih-Wei Hsieh's contributions to semiconductor technology exemplify the impact of innovation in the electronics industry. His patents and collaborations continue to shape the future of semiconductor devices.