Tainan, Taiwan

Chih-Ping Chang

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Ping Chang. Retrieved from https://idiyas.com/inventor/chih-ping-chang-zrm1pr7f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Chih-Ping Chang: Innovator in Semiconductor Technology

Introduction

Chih-Ping Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to metal-insulator-metal capacitors.

Latest Patents

Chih-Ping Chang holds a patent for a "Metal-insulator-metal capacitor and methods of manufacturing." This invention provides a semiconductor device that includes a photodiode device electrically connected to a metal-insulator-metal deep-trench capacitor. The design features a layer of amorphous material positioned between an insulator layer stack and a capacitor bottom metal layer. This configuration enhances the performance of the semiconductor device by reducing leakage associated with grain boundaries and crystal defects.

Career Highlights

Chih-Ping Chang is associated with Taiwan Semiconductor Manufacturing Company Ltd., where he has been instrumental in advancing semiconductor technologies. His work has focused on improving the efficiency and reliability of semiconductor devices.

Collaborations

Chih-Ping Chang has collaborated with notable colleagues, including Min-Ying Tsai and Ching I Li, contributing to various projects in the semiconductor field.

Conclusion

Chih-Ping Chang's innovative work in semiconductor technology, particularly his patent on metal-insulator-metal capacitors, showcases his commitment to enhancing device performance. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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