Taichung, Taiwan

Chih-Ming Chi

This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2002.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Chih-Ming Chi: Innovator in Waferless Seasoning Processes

Introduction

Chih-Ming Chi is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly with his innovative approaches to etching processes. His work has been recognized for its potential to enhance the efficiency and effectiveness of etching machines.

Latest Patents

Chih-Ming Chi holds a patent for a waferless seasoning process. This process is designed for use in an etching chamber of an etching machine, especially in challenging environments where traditional etching cannot be performed. The patented method involves a dry cleaning process utilizing a plasma formed by oxygen and hydrogen bromide, which helps restore the etching environment within the chamber. This innovation is crucial for maintaining the functionality of etching machines under adverse conditions.

Career Highlights

Chih-Ming Chi is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His role involves developing advanced technologies that improve manufacturing processes. His expertise in etching processes has positioned him as a valuable asset to his team and the company.

Collaborations

Chih-Ming Chi has collaborated with several talented individuals in his field, including Wen-Hua Cheng and Yu-Chang Chow. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Chih-Ming Chi's contributions to the semiconductor industry, particularly through his waferless seasoning process, highlight his role as an influential inventor. His work continues to impact the efficiency of etching processes, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
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