Company Filing History:
Years Active: 2025
Title: Innovations of Chih-min Hsiao in Semiconductor Technology
Introduction: Chih-min Hsiao is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for forming patterned mask layers. His work is essential in advancing manufacturing processes in the semiconductor industry.
Latest Patents: Chih-min Hsiao holds a patent for a "Method for forming patterned mask layer." This method involves several steps, including forming a layer over a substrate, creating first and second strip structures, and applying a spacer layer. The process culminates in the removal of the spacer layer, resulting in a patterned mask layer formed by the various strip structures.
Career Highlights: Hsiao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role at the company allows him to apply his innovative ideas and contribute to cutting-edge technology.
Collaborations: Throughout his career, Chih-min Hsiao has collaborated with talented individuals such as Yu-Chen Chang and Chien-Wen Lai. These collaborations have fostered a creative environment that enhances the development of new technologies.
Conclusion: Chih-min Hsiao's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and inspire future innovations.