This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2018.
Company Filing History:
Years Active: 2018
Title: Innovations of Chih-I Wei in Photomask Technology
Introduction: Chih-I Wei is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of photomask technology. His innovative approach has led to the development of a unique method for forming photomasks, which is crucial in the semiconductor manufacturing process.
Latest Patents: Chih-I Wei holds 1 patent for his invention titled "Method of forming photomask." This method involves providing a first layout pattern to a computer system, generating an assist feature pattern based on that layout, and integrating it into a second layout pattern. The process includes performing an optical proximity correction without altering the assist feature pattern, ultimately outputting a third layout pattern to create a photomask.
Career Highlights: Chih-I Wei is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in enhancing the efficiency and accuracy of photomask production.
Collaborations: Throughout his career, Chih-I Wei has collaborated with talented individuals such as Chia-Wei Huang and Yung-Feng Cheng. These collaborations have fostered innovation and contributed to advancements in their field.
Conclusion: Chih-I Wei's contributions to photomask technology exemplify the importance of innovation in the semiconductor industry. His patented method showcases his expertise and commitment to advancing technology.