Chih-Hung Wu

Title: Chih-Hung Wu: Innovator in CMOS Thin Film Transistor Technology

Introduction

Chih-Hung Wu is a notable inventor based in Shinjuang, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of thin film transistors.

Latest Patents

Chih-Hung Wu holds a patent for a "Method of forming a CMOS thin film transistor device." This innovative method involves a dry etching procedure that removes part of a photoresist layer and part of a metal layer, resulting in a gate with a symmetrical cone shape. The process exposes the dielectric layer in the lightly doped area, with the bottom width of the first gate being narrower than that of the first metal layer. The symmetrical cone shape gradually becomes thinner from bottom to top. This technique allows for n-ion implantation to form a self-aligned and symmetrical LDD region in a semiconductor layer without the need for additional photolithography steps.

Career Highlights

Chih-Hung Wu is currently associated with AU Optronics Corporation, where he continues to advance his research and development efforts in semiconductor technologies. His work has been instrumental in enhancing the efficiency and performance of thin film transistors.

Collaborations

Chih-Hung Wu has collaborated with fellow inventor Chih-Chin Chang, contributing to the advancement of their shared field of expertise.

Conclusion

Chih-Hung Wu's innovative methods in forming CMOS thin film transistor devices highlight his significant role in the semiconductor industry. His contributions continue to influence the development of advanced technologies in this field.