This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Basf Se Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Chih Hui Lo: Innovator in Silicon-Germanium Etching Technology
Introduction
Chih Hui Lo is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes for silicon-germanium materials. His innovative work has implications for the advancement of electronic devices and materials science.
Latest Patents
Chih Hui Lo holds a patent for a composition, its use, and a process for selectively etching silicon-germanium material. This patent, which is crucial for the semiconductor industry, discloses a composition designed to selectively etch a layer that includes a silicon-germanium alloy (SiGe) while preserving a layer of silicon. This innovation enhances the precision and efficiency of semiconductor manufacturing processes.
Career Highlights
Chih Hui Lo is currently associated with BASF SE Corporation, a leading global chemical company. His role at BASF allows him to leverage his expertise in materials science and semiconductor technology, contributing to the development of advanced materials and processes.
Collaborations
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Conclusion
Chih Hui Lo's contributions to the field of semiconductor technology, particularly through his patent on silicon-germanium etching, highlight his role as an innovator in the industry. His work continues to influence advancements in electronic materials and processes.