Location History:
- Hsin-chu, TW (2015)
- Hsin-chu-shi, TW (2018)
Company Filing History:
Years Active: 2015-2018
Title: Chih-Hsuan Chen: Innovator in Plasma Processing Technology
Introduction
Chih-Hsuan Chen is a notable inventor based in Hsin-chu-shi, Taiwan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on advanced methods and apparatuses that enhance the efficiency and effectiveness of plasma processing.
Latest Patents
Chih-Hsuan Chen's latest patents include innovative methods for plasma processing. One patent describes a plasma processing method that performs an etching process by supplying a fluorine-containing gas into a plasma processing space. This method etches a target substrate, forming a silicon oxide film or a silicon nitride film on a surface of a metal silicide film. The process involves a reduction phase where a hydrogen-containing gas is introduced to reduce a metal-containing material. Finally, a removal process is conducted using an oxygen-containing gas to eliminate the reduced metal. Another patent outlines a similar plasma processing method, but it focuses on a nickel silicide film instead of a metal silicide film, showcasing the versatility of his techniques.
Career Highlights
Chih-Hsuan Chen is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at the company has allowed him to develop and refine his innovative plasma processing methods, contributing to advancements in semiconductor manufacturing.
Collaborations
Chih-Hsuan Chen has collaborated with notable colleagues, including Akitoshi Harada and Yen-Ting Lin. These collaborations have fostered a productive environment for innovation and have led to the development of cutting-edge technologies in plasma processing.
Conclusion
Chih-Hsuan Chen is a prominent figure in the field of plasma processing, with a focus on developing methods that enhance semiconductor manufacturing. His contributions through his patents and work at Tokyo Electron Limited highlight his commitment to innovation in this critical area of technology.