Chih-Haw Huang

Title: Chih-Haw Huang: Innovator in Semiconductor Fabrication

Introduction

Chih-Haw Huang is a notable inventor based in Jhubei, Taiwan. He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative patent.

Latest Patents

Chih-Haw Huang holds a patent titled "Mask for controlling line end shortening and corner rounding arising from proximity effects." This invention provides a mask for producing an image feature on an image surface during a semiconductor fabrication process. The mask comprises a main feature with opaque and transmissive areas arranged in the form of the image feature. Each end of the main feature includes at least one opaque edge and one transmissive edge. The opaque edge contains a set of transmissive assist features that align alternately with the transmissive areas of the main feature. Meanwhile, the transmissive edge includes a set of opaque assist features that align alternately with the opaque areas of the main feature. Chih-Haw Huang has 1 patent to his name.

Career Highlights

Chih-Haw Huang is currently employed at Macronix International Co., Ltd., where he continues to work on advancements in semiconductor technology. His expertise in the field has positioned him as a valuable asset to the company.

Collaborations

Chih-Haw Huang has collaborated with notable colleagues, including Chin-Cheng Yang and Chiao-Wen Yeh. Their combined efforts contribute to the innovative environment at Macronix International Co., Ltd.

Conclusion

Chih-Haw Huang's contributions to semiconductor fabrication through his patent demonstrate his innovative spirit and commitment to advancing technology. His work continues to impact the industry positively.