Taichung, Taiwan

Chih-Feng Ku

This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Feng Ku. Retrieved from https://idiyas.com/inventor/chih-feng-ku

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Chih-Feng Ku: Innovator in Semiconductor Fabrication

Introduction

Chih-Feng Ku is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in device fabrication.

Latest Patents

Chih-Feng Ku holds a patent titled "Method for Fabricating Semiconductor Device." This patent outlines a method that includes several key steps. The process begins with providing a substrate that has a gate structure, which comprises a high-k dielectric layer. The method then involves increasing the ambient pressure around the gate structure to a predetermined level by injecting a first gas. Following this, the ambient pressure is reduced to a base pressure, and a spacer is formed around the gate structure. This innovative approach enhances the efficiency and performance of semiconductor devices. He has 1 patent to his name.

Career Highlights

Chih-Feng Ku is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Shao-Wei Wang and Yu-Ren Wang. Their collective expertise contributes to the innovative environment at United Microelectronics Corporation.

Conclusion

Chih-Feng Ku's contributions to semiconductor fabrication demonstrate his commitment to innovation and excellence in technology. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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