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Years Active: 2015
Title: Chih-Chung Tai: Innovator in LDMOS Technology
Introduction
Chih-Chung Tai is a prominent inventor based in Shanghai, China. He is known for his contributions to the field of semiconductor technology, particularly in the development of LDMOS devices. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this specialized area.
Latest Patents
Chih-Chung Tai holds a patent for an LDMOS device and its fabrication method. This patent describes various embodiments that provide LDMOS devices and fabrication methods. The invention includes an N-type buried isolation region in a P-type substrate, along with a P-type epitaxial layer that consists of a first region and a second region. The design features an annular groove that surrounds the first region, exposing the surface of the N-type buried isolation region. Isolation layers are formed on both sidewalls of the annular groove, and an annular conductive plug is created within the groove, ensuring contact with the N-type buried isolation region. A gate structure of an LDMOS transistor is then formed over the first region of the P-type epitaxial layer. This innovative approach enhances the performance and reliability of LDMOS devices.
Career Highlights
Throughout his career, Chih-Chung Tai has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these leading firms has allowed him to refine his skills and contribute significantly to advancements in semiconductor technology.
Collaborations
Chih-Chung Tai has collaborated with esteemed colleagues in his field, including Gangning Wang and Guangli Yang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Chih-Chung Tai's contributions to LDMOS technology and his innovative patent demonstrate his significant impact on the semiconductor industry. His work continues to influence advancements in this critical field, showcasing the importance of innovation in technology.