New Taipei, Taiwan

Chih-Chang Lai

This inventor holds 1 USPTO granted patent. Top assignee: Orbotech Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-Chang Lai. Retrieved from https://idiyas.com/inventor/chih-chang-lai-95q2blcj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Chih-Chang Lai

Introduction

Chih-Chang Lai is a notable inventor based in New Taipei, Taiwan. He has made significant contributions to the field of technology, particularly in the area of defect detection in panels. His innovative approach has led to the development of a unique patent that enhances the accuracy of defect location reporting.

Latest Patents

Chih-Chang Lai holds a patent for a "Panel design to improve accurate defect location report." This invention describes an array checker (AC) that includes software designed to implement a specific method. By utilizing this method, the array checker can detect the location of a defect and compensate for any shifts in that defect. The process involves generating reference lines in a panel, capturing an image of the panel through voltage imaging, and calculating offsets to ensure precise defect location.

Career Highlights

Chih-Chang Lai is currently employed at Orbotech Limited, a company known for its advanced technology solutions. His work at Orbotech has allowed him to focus on innovations that improve manufacturing processes and quality control.

Collaborations

Throughout his career, Chih-Chang Lai has collaborated with talented individuals such as Nai-Wei Chen and Jongho Lee. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Chih-Chang Lai's contributions to the field of technology through his innovative patent demonstrate his commitment to improving defect detection methods. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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