Chien-Shian Peng

Title: Chien-Shian Peng: Innovator in Microelectronic Fabrication

Introduction

Chien-Shian Peng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of microelectronics, particularly through his innovative patent that addresses challenges in microelectronic fabrication.

Latest Patents

Chien-Shian Peng holds a patent titled "Patterned conductor layer passivation method with dimensionally stabilized planarization." This patent outlines a method for forming a microelectronic fabrication that begins with providing a substrate. A patterned conductor layer is then formed over the substrate, which has a topographic variation at its periphery. Following this, a planarizing passivation layer made of a thermally reflowable material is formed over the substrate to passivate the topographic variation. A dimensionally stabilizing layer is then applied on top of the planarizing passivation layer. Finally, the microelectronic fabrication undergoes thermal annealing to create a thermally annealed planarizing passivation layer. This innovative approach helps to attenuate the replication of the topographic variation at the periphery of the patterned conductor layer.

Career Highlights

Chien-Shian Peng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing the efficiency and effectiveness of microelectronic fabrication processes.

Collaborations

Chien-Shian Peng has collaborated with notable colleagues, including Fu-Jier Fahn and Kuo-Wei Lin. These collaborations have contributed to advancements in the field of microelectronics.

Conclusion

Chien-Shian Peng's innovative work in microelectronic fabrication, particularly through his patented methods, showcases his significant contributions to the industry. His efforts continue to influence advancements in semiconductor technology.