Chien-Jiun Wang

Title: Innovations of Chien-Jiun Wang in Silicon Oxidation Processes

Introduction

Chien-Jiun Wang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the processes of silicon oxidation. With a total of 3 patents, his work has advanced the technology used in the production of silicon oxide layers.

Latest Patents

Wang's latest patents include a dual-stage wet oxidation process that utilizes varying H2/O2 ratios. This method describes a technique for forming silicon oxide layers on silicon wafers through a dual-stage pyrolysis process. The process involves flowing a first H2/O mixture with a higher gas mixture ratio into a torch, followed by feeding the generated water vapor into a wet oxidation chamber to create the first layer of silicon oxide. Subsequently, a second H2/O mixture with a lower gas mixture ratio is introduced to form a second thickness of the silicon oxide layer. This innovative approach minimizes the loading effect in the furnace tube and enhances the uniformity of the deposited silicon oxide layers.

Another significant patent is an apparatus and method for oxidizing silicon substrates. This invention allows for both wet and dry oxidation processes to occur within the same oxidation chamber. The apparatus includes an additional conduit to evacuate residual water vapor, ensuring that it does not interfere with subsequent dry oxidation processes. This capability enables the formation of high-quality thin silicon oxide films, which are essential in semiconductor applications.

Career Highlights

Chien-Jiun Wang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has positioned him at the forefront of innovation in silicon processing technologies. His contributions have been instrumental in improving the quality and efficiency of silicon oxide film production.

Collaborations

Wang has collaborated with several talented individuals in his field, including Ching-Yu Huang and Yu-Sen Chu. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Chien-Jiun Wang's innovative work in silicon oxidation processes has significantly impacted the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes. Wang's contributions continue to shape the future of silicon wafer production.